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Affidabilità dei Dispositivi Ferroelettrici: il futuro

         dell’elettronica di nuova generazione












                  Reliability of Ferroelectric Devices:  the future of next-generation electronics


                  Ferroelectrics are special materials in which electrical charge can be stored in a (semi-) permanent and
                  reversible manner. Thanks to this, ferroelectrics can be used to make ‘non-volatile’ semiconductor memo-
                  ries. It is also possible to use ferroelectrics to make neurosynaptic devices that can mimic the behaviour
                  of biological synapses. These devices can be used in electronic systems inspired by the functioning of
                  the human brain for artificial intelligence applications. The electronics research group Devices, Circuits &
                  Systems of the Enzo Ferrari Engineering Department - DIEF, led by Prof. Paolo Pavan and Prof. Francesco
                  Maria Puglisi, has dedicated itself to the study of ferroelectric devices, in particular to researching the reli-
                  ability of ferroelectric transistors, known as FeFETs. The team published a review article entitled ‘Reliability
                  of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges’ in the prestigious
                  journal Proceedings of the IEEE, which delves into technological developments in the field of electrical and
                  computer engineering. The review article, which could become a benchmark for the scientific community
                  on ferroelectrics, is part of a fruitful research collaboration with Prof. Muhammad Ashraful Alam of Purdue
                  University, USA, an expert on electronic devices and Fellow of the IEEE (Institute of Electrical and Electronics
                  Engineers). The research activity, which led to the publication of contributions in prestigious international
                  scientific journals, was carried out by Dr Nicolò Zagni during his mobility period during his PhD at Purdue
                  University and as a research fellow at DIEF. The discovery of ferroelectric properties in hafnium oxide (HfO2)
                  has opened up the possibility of integrating these devices on a large scale, as HfO2 is a material used for
                  the manufacture of transistors in the CMOS (Complementary Metal Oxide Semiconductor) family, which is
                  the basis of almost all commercial devices.













                        l 23 Dicembre 1947 il primo transistor   Una delle tecnologie più promettenti sono
                        funzionante fu dimostrato ai Bell Labs   i dispositivi ferroelettrici. I ‘ferroelettrici’ sono
                        da John Bardeen, Walter Brattain e Wil-  particolari materiali nei quali può essere imma-
                        liam Shockley. Questa importantissima   gazzinata della carica elettrica in modo (semi)
                  Iinvenzione valse loro il premio Nobel per   permanente  e  reversibile.  Grazie  a  queste  loro

                la Fisica e rivoluzionò per sempre il mondo.   proprietà, i ferroelettrici possono essere utilizzati
                                                               per realizzare memorie ‘non-volatili’ a semicon-
                  A 75 anni da allora, la ricerca per realizzare di-
                spositivi a semiconduttore sempre più performanti   duttore. Inoltre è possibile utilizzare i ferroelet-

                e più efficienti è più vitale che mai.         trici per realizzare  dispositivi neuro-sinaptici
                                                               in grado di mimare il comportamento delle




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